Molecular precursor solution −Comparison to sol-gel method
The molecular precursor solution is a polar solvent solution consisting of an amine and a metal complex or a metal salt prepared using the molecular precursor method. It is very stable in water as compared to the sol-gel precursor solution, which strongly decomposes in water (moisture).
Due to its stability and miscibility, the molecular precursor method is superior for the formation of thin films and can be easily applied to a large surface area. Coated films on the surface of a substrate can be washed away with water (or alcohol), allowing the substrate to be washed and reused, but only before heat treatment. This is necessary at a large scale in case of errors during precursor solution application to the substrate. Furthermore, this also helps to increase profits, as the substrate can be recycled. The molecular precursor solution can be applied to materials such as glass, metals, and ceramics.
TFLEAD-TI −Precursor solution for the fabrication of titanium oxide thin films
TFLEAD-TI is a precursor solution for titanium oxide thin film fabrication. Titanium oxide thin film is an attractive material. There is a high possibility of it being used in various fields such as ferroelectric materials and optical materials in the near future. Therefore, the handling procedure and solution stability were considered when fabricating this thin film.
This molecular precursor solution is highly stable and miscible in water. A homogeneous, uniform, and pinhole-free titanium oxide thin precursor film can be easily fabricated by heat treatment.
TFLEAD-ZR −Precursor solution for the fabrication of zirconium oxide thin films
TFLEAD-ZR is a precursor solution for zirconium oxide thin film fabrication. Zirconium oxide attracts attention as functional materials used for wear-resistant film and dielectric materials. It is expected that the material attracting attention more in future. Therefore, the handling procedure and solution stability were considered when fabricating this thin film.
This molecular precursor solution is highly stable and miscible in water. A homogeneous, uniform, and pinhole-free zirconium oxide thin precursor film can be easily fabricated by heat treatment.
TFLEAD-CO −Precursor solution for the fabrication of cobalt oxide thin films
TFLEAD-CO is a precursor solution for cobalt oxide fabrication. A spinel-type cobalt oxide (Co3O4) film is used as a heat collector material.
In recent years, cobalt oxide compounds have become attractive materials for use as thermoelectric materials and electrode materials in lithium ion batteries. They are expected to be extensively used in various material fields in future.
This molecular precursor solution is highly stable and miscible in water. A homogeneous, uniform, and pinhole-free cobalt oxide thin precursor film can be easily fabricated by heat treatment.
TFLEAD-CAp −Precursor solution for the fabrication of CA thin films
TFLEAD-CAp is a precursor solution for carbonate apatite fabrication.
After the precursor solution is coated on the material surface, a homogeneous, uniform, and pinhole-free carbonate apatite film can be easily fabricated by heat treatment. Apatite is not only a well-known material that is a major component of teeth and bone but it also has superior adsorption abilities.
Molecular precursor solutions can be used in all coating techniques, such as dip coating, spray coating, and spin coating. Therefore, it can be easily coated onto catalyst materials, porous bodies, and materials having complex shapes (such as columns). In addition, carbonate apatite is applicable to the development of medical materials for studies, because it is superior to biocompatible ceramics.
Carbonate apatite is expected to be used in industrial and medical fields in the future.
Others molecular precursor solutions under development
Research and development of other types of molecular precursor solutions such as Sn, Ga, Li, Zn, Mg, Na, and K are currently underway.
In line with the recent escalation in elemental strategies, the molecular precursor method advances the research and development of new materials by proposing new methods in the field of materials development.
We continue to be committed to developing more excellent functional materials.
Handling precautions
Molecular precursor solutions are chemical materials. Please handle them with care.